EMI film is applied to laptop, mobile shell, telephone, wireless telecommunications, audiovisual electron, remote controller, navigation, medical tool and ect. The machine is with high-power magnetic control supply, It is fully automatic controlling, double targets alternately, constant flow output. The unique work rest is rotation and revolution and has the advantage of big capacity and high non-defective rate. The machine measures the film thickness accurately by crystal film thickness controller. PLC and touching screen make up the fully automatic controlling system which can modify data at anytime.
Magnetron sputtering (EMI) technical parameter specification
|
Model |
ZCK-1200B |
ZCK-1400B |
ZCK-1600B |
ZCK-1800B |
|
Chamber Size |
1200×1500 |
1400×1950 |
1600×1950 |
1800×1950 |
|
Coating Film Type |
EMI, decorative film |
|
Supply Type |
DC magnetic control supply & high voltage ion bombardment supply |
|
Column Target |
DC magnetic control target (oxygen-free Cu target & stainless steel target) |
|
Vacuum Chamber |
vertical double / single door |
|
Vacuum System |
slide valve pump & roots pump & diffusion pump & maintaining pump ( optional
molecular pump, deep cold pump, deep cold system ) |
|
Inflation System |
mass flow controller(1-3 ways) |
|
Ultimate Vacuum |
6×10－4pa（unloaded and clean） |
|
Pumping Time |
from atmosphere to 5×10－3Pa less than 15 minutes |
|
Rotation |
6/8/9shafts rotation and revolution / stepless speed regulation of frequency conversion |
|
Controlling |
manual & semi automatic & fully automatic / touching screen & PLC |
|
Remark |
can be designed and made according to customers’ request |
The above is for your information only.
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