Modern
Technology Modern Equipment The mid-frequency
magnetron sputtering technology is another new
milestone in the vacuum field. It is the ideal equipment
for preparing high quality films of compound and oxide.
The equipment has high deposition rates, overcomes striking
arc and uses for preparing the films of ITO, AL2O3,
SiO2, TiO2, Si3N4,
etc. When it is equipped with the several targets
and film thickness monitor, it can make the multi-layer
films.
Applications
High-Grade
Rearview Mirror
Transparent
Protective Film on High-grade Adornments
New-Type
Multi-Layer Extra-Hard Coating
Optical
Filming (e.g. antireflex coating)
ITO
& LOW-E
Glass Production Line
Technical
Data Table
Model
ZCK-1000
ZCK-1200
ZCK-1300
Chamber
Size
Ф1000X1250
Ф1200X1250
Ф1300X1500
Ultimate
Pressure
10-4Pa
10-4Pa
10-4Pa
Pumping
Down Time
Atmosphere
to 6.6X10-2Pa
leas than 8 min in empty condition
Film
Thickness Monitor *
Crystal
film thickness monitor
Evaporator
Source *
Resistor
evaporator, 4 pair electrodes (each 5Kw)
Twins
Target
A
pair (Mid-frequency)
Ion
Bomb
3000V
600MA
3000V
600MA
3000V
300MA
Rotary
Model of Fixture
Planetary
gear set substrate carriers, speed controlled
by inverter
Vacuum
Sys
K-600、ZJ-600、
2X-70
KT-600、ZJ-600、
2X-70
KT-600、ZJ-600、2X-70
or
KT-800、H-150、ZJ-600
Gas-Filling
Mass
flow controller
Substrate
Backing (Max.)
350≧
350≧
350≧
Fully
automatic control by PLC and touching screen
Note:
The item with asterisk can be changed on client's
demand.
